Application of 3C duct design method in semiconductor factory process exhaust systems

Summary

Reports on the design of a process exhaust system in a semiconductor factory using the 3C duct design method.  The 3C design method comprises three major calculation procedures:  initial computer-aided design, computer-aided simulation, and correction processes. Presents a case study to demonstrate the characteristics of the 3C method. The case study shows that the 3C duct design method contains a simple computation procedure and considers the pressure equilibrium under certain limits on space or flow velocity.  Concludes that the 3C design method not only shortens the design schedule and prevents human calculation errors but also reduces the dependence on designer experience.

Primary Author(s): Chen W-L., Chen S-L., Ting C-C, et al

Source: ASHRAE Trans., 2002, vol.108, part 1, paper number 4513, p210-220, 4 figs., 9 tabs.,refs.

             BSRIA Abstract Doc 000103934 Abs 20022364

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