A small Italian company has developed a system of deposition for electrochromic devices on small formats ( 50*50 mm ) with RF sputtering techniques. It can be used in optics, electronics, innovative materials ( micro/nano-electronics ) and surface treatment. An advantage is the possibility to vary the transparency ( intensity of the optic filter ) through a difference of potential to low voltage. The company is looking for industry/research centres to make the developed technology productive.
Source: MIRC Partner Search
Reference No. 041.OT.CB.APRE
For more information on this source please contact [email protected]
Date posted on KIBT: 19 March 2004
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